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High-Contrast and Fast Photorheological Switching of a Twist-Bend Nematic Liquid Crystal

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Photonic topological phase transition induced by material phase transition.

Takahiro Uemura^1,2, Yuto Moritake¹, Taiki Yoda^1,2

¹Department of Physics, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro, 152-8550, Tokyo, Japan.

Science Advances

|August 23, 2024

Summary

Researchers demonstrate reconfigurable photonic topological phase transitions in 2D photonic topological insulators (PTIs). This breakthrough uses phase-change material nanopatterns to control topological invariants, paving the way for advanced photonic circuits.

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Area of Science:

Photonics
Condensed Matter Physics
Materials Science

Background:

Photonic topological insulators (PTIs) are analogs to electronic topological insulators with potential in integrated circuits.
Current PTIs lack control over topological phases post-fabrication due to fixed structures.

Purpose of the Study:

To experimentally demonstrate a controllable photonic topological phase transition in 2D PTIs.
To achieve reconfigurable control of topological invariants using phase-change materials.

Main Methods:

Designed and fabricated nanopatterns of the phase-change material Ge2Sb2Te5 (GST).
Utilized ultrafine lithographic alignment to integrate GST nanopatterns into a 2D PTI.
Induced band inversion and topological phase transitions via GST material phase changes.

Main Results:

Observed the first photonic topological phase transition in a 2D PTI by altering the Chern number.
Demonstrated reconfigurable control of topological properties through symmetry-breaking GST nanopatterns.
Successfully altered topological invariants by changing the symmetry of the GST nanopatterns.

Conclusions:

The study presents a novel method for controlling photonic topological properties in a reconfigurable manner.
This approach enables dynamic manipulation of topological invariants, crucial for reconfigurable photonic processing circuits.
Highlights the potential of phase-change materials and advanced lithography for next-generation photonic devices.