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Maxillary sinus membrane perforation rate utilizing osseodensification-mediated transcrestal sinus floor elevation: A
Ziv Mazor1, Joao Gaspar2, Robert Silva3
1Private Practice, Tel Aviv, Israel.
Osseodensification (OD) burs for transcrestal sinus floor elevation (TSFE) show a low membrane perforation rate. Lower residual bone height (RBH) is a key risk factor for perforation during this dental implant procedure.
Area of Science:
- Oral and Maxillofacial Surgery
- Dental Implantology
- Regenerative Dentistry
Background:
- Transcrestal sinus floor elevation (TSFE) is a common procedure to augment the maxillary sinus.
- Osseodensification (OD) offers a bone-preserving approach for TSFE.
- Understanding membrane perforation risks is crucial for successful outcomes.
Purpose of the Study:
- To evaluate the membrane perforation rate during TSFE using osseodensification (OD) burs.
- To identify risk factors associated with sinus membrane perforations in TSFE.
Main Methods:
- A multicenter, cross-sectional clinical study involving 621 patients.
- Standardized TSFE protocol using OD burs across six centers.
- Analysis of factors including residual bone height (RBH), tooth region, and bone type.
Main Results:
- A low sinus membrane perforation rate of 7.31% (49/670 sites) was observed.
- Residual bone height (RBH) ≤3 mm was a significant risk factor for perforation.
- RBH between 3-5 mm also increased perforation risk; tooth region and implant site were not significant factors.
Conclusions:
- Osseodensification (OD) drilling for TSFE demonstrates a low membrane perforation rate.
- Severe posterior maxillary atrophy, indicated by low RBH, is a primary risk factor for increased perforation during TSFE.
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