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Direct Laser Writing of Micro-Nano Filters Based on Three-Photon Polymerization
Jiubin Jue1,2,3, Zongsong Gan1,2,3
1Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, Hubei 430074, People's Republic of China.
ACS Applied Materials & Interfaces
|August 29, 2024
Summary
This study introduces three-photon direct laser writing (DLW) to fabricate high-concentration quantum dot (QD)-polymer photoresists for advanced optical filters. This method overcomes limitations of two-photon DLW for near-infrared applications.
Area of Science:
- Materials Science
- Nanotechnology
- Optics
Background:
- Direct laser writing (DLW) is crucial for manufacturing functional quantum dot (QD)-polymer nanostructures.
- Existing two-photon DLW methods struggle with near-infrared QDs due to linear absorption and low doping concentrations.
Purpose of the Study:
- To develop a method for fabricating near-infrared QD-polymer photoresists with high QD concentrations.
- To enable the production of high-performance optical filters for visible and near-infrared light.
Main Methods:
- Introduced three-photon DLW using a 1035 nm near-infrared laser to circumvent linear absorption.
- Prepared three types of QD-polymer photoresists with concentrations up to 150 mg mL⁻¹ via QD surface modification.
Main Results:
- Successfully demonstrated the feasibility of three-photon DLW for high-concentration QD-polymer photoresist fabrication.
- Fabricated micro/nano high-performance QD-polymer filters with visible and near-infrared light absorption capabilities.
Conclusions:
- Three-photon DLW effectively overcomes limitations of two-photon DLW for near-infrared QD applications.
- This research offers guidance for fabricating and applying visible and near-infrared optical filters using functional nanoparticle-polymer photoresists.
