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Nondestructive Demolding of Structure-Designable High-Aspect-Ratio Nanoimprint Template.

Shuo Chen1, Yu Shu1, Hao Cao1

  • 1The Institute of Technological Sciences, Wuhan University, Wuhan 430072, China.

Langmuir : the ACS Journal of Surfaces and Colloids
|September 12, 2024
PubMed
Summary

This study introduces a dissolvable template method for defect-free nanoimprint lithography (NIL). This technique enables nondestructive demolding of high-aspect-ratio (HAR) structures, improving replica quality.

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Area of Science:

  • Materials Science and Engineering
  • Nanotechnology
  • Lithography

Background:

  • Demolding in nanoimprint lithography (NIL) is critical for transferring patterns but faces challenges due to adhesion and friction.
  • These issues cause defects in replicas, especially for high-aspect-ratio (HAR) structures, limiting NIL's capabilities.

Purpose of the Study:

  • To develop a novel method for nondestructive demolding of structure-designable HAR nanoimprint templates.
  • To overcome the limitations of conventional demolding in NIL, particularly for complex structures.

Main Methods:

  • Fabrication of HAR nanoimprint templates using 3D lithography with a positive photoresist.
  • Utilizing a dissolvable template approach where the template is dissolved in alkaline solutions after UV exposure.
  • Implementing ultraviolet (UV) radiation for template exposure and subsequent dissolution.

Main Results:

  • Successfully transferred dense arrays of pillars with a 1.2 μm minimal diameter and an aspect ratio of 18.
  • Demonstrated successful transfer of a microlens array diffuser with randomly distributed structural parameters.
  • Achieved nondestructive and stress-free demolding of the fabricated templates.

Conclusions:

  • The dissolvable template method enables stress-free demolding, significantly reducing defects in NIL.
  • This approach is effective for replicating complex HAR structures and microlens arrays.
  • The dissolvable template method expands the application scope of nanoimprint lithography.