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Updated: Jun 13, 2025

Nanomoulding of Functional Materials, a Versatile Complementary Pattern Replication Method to Nanoimprinting
Published on: January 23, 2013
1The Institute of Technological Sciences, Wuhan University, Wuhan 430072, China.
This study introduces a dissolvable template method for defect-free nanoimprint lithography (NIL). This technique enables nondestructive demolding of high-aspect-ratio (HAR) structures, improving replica quality.
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