Jove
Visualize
Contact Us
JoVE
x logofacebook logolinkedin logoyoutube logo
ABOUT JoVE
OverviewLeadershipBlogJoVE Help Center
AUTHORS
Publishing ProcessEditorial BoardScope & PoliciesPeer ReviewFAQSubmit
LIBRARIANS
TestimonialsSubscriptionsAccessResourcesLibrary Advisory BoardFAQ
RESEARCH
JoVE JournalMethods CollectionsJoVE Encyclopedia of ExperimentsArchive
EDUCATION
JoVE CoreJoVE BusinessJoVE Science EducationJoVE Lab ManualFaculty Resource CenterFaculty Site
Terms & Conditions of Use
Privacy Policy
Policies

Related Concept Videos

You might also read

Related Articles

Articles linked to this work by shared authors, journal, and citation graph.

Sort by
Same author

LINC00324 induces nucleus pulposus cell apoptosis in intervertebral disc degeneration via miR-143-3p targeted TRAIL/DR4/DR5 axis.

Biology direct·2026
Same author

Neural oscillations underlying the impact of the road environment on hazard perception.

Scientific reports·2026
Same author

Glycine induces MafG to regulate glutathione metabolism, inhibit chondrocyte ferroptosis, and upregulate plectin to improve osteoarthritis.

Cellular signalling·2026
Same author

Mechanism-based subtypes of problematic use of the internet and corresponding neurobehavioral characteristics among children and adolescents.

Journal of child psychology and psychiatry, and allied disciplines·2026
Same author

Corrigendum to 'Hepatic cavernous hemangioma decellularized extracellular matrix/GelMA composite hydrogel promotes angiogenesis via the ITGA9-FAK-ERK1/2 axis' [Mater. Today Bio 38 (2026) 102976].

Materials today. Bio·2026
Same author

Precision Oligo(ethylene glycol) Interfaces Shape Nanoparticle Biodistribution through In Vivo Protein Corona.

Journal of the American Chemical Society·2026
Same journal

Machine-Learning-Enabled Rapid Evolution of Photoenzymes for the Asymmetric Synthesis of gem-Difluorophosphonates.

Angewandte Chemie (International ed. in English)·2026
Same journal

Sequential H<sub>2</sub>S-Triggered Redox Relay Nanoprobes for Self-Sustained Chem-Illuminating Cascade Photodynamic Therapy.

Angewandte Chemie (International ed. in English)·2026
Same journal

Quantitative Active Hydrogen Modulation via Mastering Interfacial Water Over Single Rare Earth Atom on Copper for NO<sub>3</sub> <sup>-</sup>-to-NH<sub>3</sub> Electroreduction.

Angewandte Chemie (International ed. in English)·2026
Same journal

Unveiling the Role of Hydroxyls on Catalyst Surface in CO<sub>2</sub> Hydrogenation Reaction.

Angewandte Chemie (International ed. in English)·2026
Same journal

Strain-Release Pentafluorosulfanylation of Carbonyl-Containing Disubstituted Bicyclobutanes: A Fortuitous Path to SF<sub>5</sub>-Containing Oxa[2.1.1]bicyclohexanes.

Angewandte Chemie (International ed. in English)·2026
Same journal

Quantum Spin-1/2 Rings Built From [2]Triangulene Molecular Units.

Angewandte Chemie (International ed. in English)·2026
See all related articles

Related Experiment Video

Updated: Jun 12, 2025

A Femtoliter Droplet Array for Massively Parallel Protein Synthesis from Single DNA Molecules
10:45

A Femtoliter Droplet Array for Massively Parallel Protein Synthesis from Single DNA Molecules

Published on: June 20, 2020

10.3K

Single-Component High-Resolution Dual-Tone EUV Photoresists Based on Precision Self-Immolative Polymers.

Jie Cen1, Wen Liu2, Jie Xu1

  • 1Department of Pharmacy, The First Affiliated Hospital of University of Science and Technology of China, and Laboratory of Precision and Intelligent Chemistry, Department of Polymer Science and Engineering, University of Science and Technology of China, 96 Jinzhai Road, 230026, Hefei, Anhui Province, China.

Angewandte Chemie (International Ed. in English)
|September 21, 2024
PubMed
Summary
This summary is machine-generated.

High-performance photoresists using discrete self-immolative polymers (SIPs) achieve sub-20nm resolution for electron beam and extreme ultraviolet lithography. These materials offer improved resolution, reduced line edge roughness, and excellent etch resistance, addressing key challenges in semiconductor manufacturing.

Keywords:
EUV lithographydual-tone photoresistelectron beam lithographyprecision polymerself-immolative polymer

More Related Videos

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
12:38

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium

Published on: December 16, 2011

14.7K
Fabrication of Silica Ultra High Quality Factor Microresonators
07:51

Fabrication of Silica Ultra High Quality Factor Microresonators

Published on: July 2, 2012

16.4K

Related Experiment Videos

Last Updated: Jun 12, 2025

A Femtoliter Droplet Array for Massively Parallel Protein Synthesis from Single DNA Molecules
10:45

A Femtoliter Droplet Array for Massively Parallel Protein Synthesis from Single DNA Molecules

Published on: June 20, 2020

10.3K
Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
12:38

Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium

Published on: December 16, 2011

14.7K
Fabrication of Silica Ultra High Quality Factor Microresonators
07:51

Fabrication of Silica Ultra High Quality Factor Microresonators

Published on: July 2, 2012

16.4K

Area of Science:

  • Materials Science
  • Nanotechnology
  • Chemical Engineering

Background:

  • Electron beam (EB) and extreme ultraviolet (EUV) lithography are crucial for sub-10nm resolutions in semiconductor fabrication.
  • Developing EUV photoresists that balance resolution, line edge roughness (LER), and sensitivity (RLS) is a significant challenge.
  • Self-immolative polymers (SIPs) offer a promising route for signal amplification through cascade degradation.

Purpose of the Study:

  • To introduce high-performance, single-component photoresists based on discrete self-immolative polymers (SIPs).
  • To evaluate the performance of these SIPs as dual-tone photoresists under both EB and EUV lithography.
  • To demonstrate improvements in resolution, LER, and etch resistance compared to disperse SIPs.

Main Methods:

  • Synthesis and characterization of single-component self-immolative polymers (SIPs).
  • Fabrication of discrete and disperse SIP-based photoresists.
  • Lithographic evaluation using electron beam and extreme ultraviolet exposure.
  • Analysis of resolution, line edge roughness (LER), and etch resistance.

Main Results:

  • Discrete SIPs demonstrated superior performance over disperse counterparts in both EB and EUV lithography.
  • A discrete SIP (DP of 12) achieved approximately 18nm resolution and 1.8nm LER, outperforming disperse SIPs (21nm resolution, 2.5nm LER).
  • The SIP-based photoresists exhibited excellent etch resistance due to their aromatic structures.

Conclusions:

  • Single-component discrete SIPs offer a viable solution for advanced lithography, addressing the resolution-line edge roughness-sensitivity (RLS) trade-off.
  • These materials show significant promise for next-generation nanostructure and semiconductor device fabrication.
  • The dual-tone capability and inherent signal amplification make discrete SIPs highly attractive for EUV lithography applications.