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Polymerizable Nonionic Perfluorinated Photoacid Generators for High-Resolution Lithography.

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  • 1National Engineering Research Center for Colloidal Materials, School of Chemistry and Chemical Engineering, Shandong University, 27 South Shanda Road, Ji'nan, Shandong, 250100, China.

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New fluorine-rich photoacid generators (PAGs) overcome resolution and sensitivity trade-offs in advanced photoresists. These novel PAGs minimize acid diffusion, enabling high-resolution nano-patterning for next-generation lithography.

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PAG‐bound polymersacid diffusionchemically amplified resistperfluorinated nonionic PAGphotolithography

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Area of Science:

  • Materials Science
  • Chemistry
  • Nanotechnology

Background:

  • Chemically amplified photoresists face challenges with acid diffusion, limiting resolution, line-edge roughness, and sensitivity.
  • Achieving high-resolution lithography requires overcoming the trade-off between these critical parameters.

Purpose of the Study:

  • To develop novel photoacid generators (PAGs) that enhance sensitivity and minimize acid diffusion for advanced lithography.
  • To synthesize PAG-bound polymers for improved resolution in nano-patterning.

Main Methods:

  • Development of alkene-functionalized nonionic perfluorinated photoacid generators (PAGs).
  • Synthesis of polymerizable PAG monomers and PAG-bound polymers.
  • Evaluation of lithography performance, including sub-45 nm line patterning.

Main Results:

  • Fluorine-rich PAGs exhibit enhanced photochemical reactivity, improving photoresist sensitivity.
  • Generated sulfonic acids have large sizes and minimal diffusion, effectively suppressing acid diffusion.
  • Sub-45 nm lines were patterned at an electron beam dose of 29 µC cm⁻² using PAG-bound polymer photoresists.

Conclusions:

  • The developed perfluorinated PAGs offer a promising solution for high-sensitivity and high-resolution nano-patterning.
  • PAG-bound polymers further enhance resolution by minimizing acid diffusion.
  • These materials are suitable for advanced lithography applications requiring stringent performance metrics.