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Updated: Jun 11, 2025

Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment
Published on: November 9, 2015
Unlocking high photosensitivity direct laser writing and observing atomic clustering in glass
Wenyan Zheng1, Zhuo Wang2, Weilin Chen1
1State Key Laboratory of Silicon Materials & School of Materials Science and Engineering, Zhejiang University, Hangzhou, China.
Abstract:
The direct laser writing (DLW) of photoluminescent metal clusters is inspiring intensive research in functional glasses. However, understanding the influence of the host structure on cluster formation and visualizing DLW-induced clusters at the atomic scale remains challenging. In this work, we develop a highly photosensitive fluorophosphate glass through fluorine incorporation. The addition of fluorine establishes a conducive environment for Ag+ ions before DLW and enhances the availability of reducing agents and diffusion pathways during DLW. These advantages facilitate the formation of Ag clusters under low-energy single-pulsed DLW. Increasing laser energy results in a combination of Ag clusters and glasses defect, forming a dot + ring photoluminescent pattern. Atom probe tomography (APT), a technique capable of mapping the elemental spatial distribution and identifying clustering, is employed to gain more information on laser-induced clusters. Comparison of APT results between samples without and with DLW reveals the formation of Ag clusters after laser writing. The design concept and characterization enrich the understanding of Ag cluster behavior in glasses. This knowledge opens the possibility of rational design of clusters confined in glasses and inspires their synthesis for various applications.

