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Updated: Jul 8, 2026

09:32
Cooling Rate Dependent Ellipsometry Measurements to Determine the Dynamics of Thin Glassy Films
Published on: January 26, 2016
8.1K
Erratum: "Modeling the temporal evolution and stability of thin evaporating films for wafer surface processing" [J.
Max Huber1,2,3, Xiao Hu1,2,3, Andreas Zienert1,2,3
1Fraunhofer Institute for Electronic Nano Systems ENAS, Technologie-Campus 3, 09126 Chemnitz, Germany.
The Journal of Chemical Physics
|October 1, 2024
Abstract
No abstract available in PubMed .
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