Related Experiment Video
Updated: Jun 11, 2025

14:58
Silicon Metal-oxide-semiconductor Quantum Dots for Single-electron Pumping
Published on: June 3, 2015
14.5K
Achieving Single-Electron Sensitivity at Enhanced Speed in Fully Depleted CCDs with Double-Gate MOSFETs.
Miguel Sofo-Haro1, Kevan Donlon2, Juan Estrada3
1<a href="https://ror.org/056tb7j80">Universidad Nacional de Córdoba</a> (CNEA and CONICET), Córdoba, Argentina.
Physical Review Letters
|October 7, 2024
Summary
We developed a novel double-gate MOSFET amplifier for fully depleted charge-coupled devices (CCDs), achieving high sensitivity and enabling single-electron/photon counting. This new amplifier offers significantly faster readout speeds compared to existing technologies.
Area of Science:
- Solid-state physics
- Semiconductor device engineering
- Image sensor technology
Background:
- Fully depleted charge-coupled devices (CCDs) require efficient output amplifiers for high-performance imaging.
- Existing amplifiers like floating diffusion and floating gate have limitations in speed and sensitivity.
- Novel amplifier designs are crucial for advancing CCD readout capabilities.
Purpose of the Study:
- To introduce a new output amplifier for fully depleted thick p-channel CCDs.
- To demonstrate the high sensitivity and nondestructive readout capabilities of the proposed amplifier.
- To compare the performance of the new amplifier against existing technologies.
Main Methods:
- Design and implementation of a double-gate MOSFET as a charge amplifier.
- Utilizing junction coupling between the CCD and MOSFET channels.
- Characterization of readout noise and readout speed in single and multi-sampling regimes.
Main Results:
- Achieved a readout noise of 0.74 e⁻rms/pix in single-pixel charge measurements.
- Demonstrated nondestructive readout capability.
- Attained 0.15 e⁻rms/pix with ten-sample averaging at a readout time of 2.74 ms, enabling single-electron/photon counting.
- Exhibited at least 6 times the speed of floating gate amplifiers.
Conclusions:
- The novel double-gate MOSFET amplifier provides superior performance for fully depleted CCDs.
- The amplifier enables high-sensitivity, fast, and nondestructive readout.
- This technology advances CCD imaging, particularly for applications requiring single-electron or single-photon detection.
Related Concept Videos
MOSFET: Depletion Mode
328
Depletion-mode MOSFETs represent a unique subset of MOSFET technology, functioning fundamentally differently from their enhancement-mode counterparts. Unlike enhancement MOSFETs, which require a positive gate-source voltage (Vgs) to turn on, depletion-mode MOSFETs are inherently conductive and "normally on" devices.
The primary characteristic of depletion-mode MOSFETs is their ability to conduct current between the drain and source terminals without gate bias. This inherent conductivity...
The primary characteristic of depletion-mode MOSFETs is their ability to conduct current between the drain and source terminals without gate bias. This inherent conductivity...
328
MOSFET: Enhancement Mode
300
Enhancement-mode MOSFETs are pivotal components in electronics, distinguished by their capacity to act as highly efficient switches. They are part of the larger family of metal-oxide Semiconductor Field-Effect Transistors (MOSFETs). They are available in two types: p-channel and n-channel, each tailored to specific polarity operations.
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
300
MOS Capacitor
719
A Metal-Oxide-Semiconductor (MOS) capacitor is a fundamental structure used extensively in semiconductor device technology, particularly in the fabrication of integrated circuits and MOSFETs (metal-oxide-semiconductor field-effect transistors). The MOS capacitor consists of three layers: a metal gate, a dielectric oxide, and a semiconductor substrate.
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
719

