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Development of a high-precision long trace profiler utilizing shear measurements
Xiaowen Cui1,2, Ming Wu1,2, Han Dong1,2
1Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China.
This study introduces a new long trace profiler using a shearing measurement technique to accurately measure large-scale surface shapes. The system compensates for pitch errors, achieving high precision for optical testing.
Area of Science:
- Optical metrology
- Precision engineering
- Surface characterization
Background:
- Deflectometric profilers face challenges with pitch error during scanning for large-scale surface measurements.
- System errors from optical imperfections significantly impact measurement accuracy.
Purpose of the Study:
- To present a novel long trace profiler (LTP) utilizing a shearing measurement technique.
- To address and compensate for pitch errors in large-scale surface shape measurements.
- To minimize system errors by maintaining a fixed distance between the optical head and the tested mirror.
Main Methods:
- Implementation of a shearing measurement technique with two independent air-bearing carriages for separate shearing and scanning movements.
- Utilizing a double shear measurement method combined with low-spatial-frequency filtering.
- Conducting simulation studies to evaluate error mitigation strategies.
Main Results:
- The double shear method with low-pass filtering effectively reduces high-frequency angular errors from air-bearing instability.
- Experimental tests on flat mirrors demonstrated measurement precision below 50 nrad root mean square (rms).
- The system design minimizes errors caused by optical device imperfections.
Conclusions:
- The developed long trace profiler with shearing technique offers a robust solution for accurate large-scale surface shape measurement.
- The system effectively compensates for pitch errors and minimizes environmental and instrumental influences.
- Achieved sub-50 nrad rms precision validates the system's performance for demanding optical applications.
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