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Updated: Jun 30, 2026

Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
Published on: November 1, 2013
Near-critical Stranski-Krastanov growth of InAs/InP quantum dots.
Yury Berdnikov1,2, Paweł Holewa3,4,5, Shima Kadkhodazadeh3,6
1NanoPhoton - Center for Nanophotonics, Technical University of Denmark, Kongens Lyngby, 2800, Denmark. yuryberdnikov@gmail.com.
Researchers precisely controlled the size and density of Indium Arsenide/Indium Phosphide (InAs/InP) quantum dots. This advancement enables tunable emission wavelengths for telecom applications.
Area of Science:
- Materials Science
- Nanotechnology
- Semiconductor Physics
Background:
- Quantum dots (QDs) are crucial for optoelectronic devices.
- Controlling QD size and density is essential for tunable emission.
- Stranski-Krastanov growth is a common method for QD fabrication.
Purpose of the Study:
- To demonstrate precise control over InAs/InP quantum dot surface density and size.
- To explore the near-critical growth regime for QD tuning.
- To achieve well-isolated QD emission lines in the telecom C-band.
Main Methods:
- Tailoring Stranski-Krastanov growth conditions.
- Utilizing experimental growth parameter adjustments.
- Employing computational modeling for analysis.
Main Results:
- Achieved tunable QD densities from to .
- Demonstrated independent control of QD size and surface density.
- Obtained low-density QD ensembles with isolated C-band emission.
Conclusions:
- The Stranski-Krastanov method allows wide-range control of InAs/InP QD characteristics.
- Independent tuning of QD size and density is feasible.
- The developed method is suitable for producing QDs for telecom applications.
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