Trace Cu-Induced Low CN Coupling Barrier on Amorphous Co Metallene Boride for Boosting Electrochemical Urea

Yueji Wu1, Han Lin1, Qiqi Mao1

  • 1State Key Laboratory Breeding Base of Green-Chemical Synthesis Technology, College of Chemical Engineering, Zhejiang University of Technology, Hangzhou, 310014, P. R. China.