Multiparameter Method for Developer Screening of Molecular Glass Resists via Molecular Simulations

Efficient and accurate developer screening is critical for high-resolution lithography. In this study, a multiparameter (MP) method simultaneously based on the Hansen solubility parameters (HSP), two-component solubility parameters (TSP), and order parameter (OP) is proposed for the developer screening of molecular glass resists via molecular dynamics simulation. A customized solvent database, including 80 organic solvents, is created for the subsequent developer screening. Two diagram forms of HSP (δ-δ-δ diagram and δ-δ diagram) were investigated, and the δ-δ diagram is utilized due to its higher solubility prediction consistency with OP. Then, two solubility prediction diagrams, i.e., HSP&OP and TSP&OP diagrams, were formed using the MP method. The developer screening scheme using the MP method is illustrated for a decomposable resist, AD10BOC, and a cross-linkable resist, AD4C. Meanwhile, the feasibility of the developer screening scheme is verified by practical lithography experiments. In addition, relative solvation free energy (RSFE) calculations and dissolution experiments of six resists are implemented to further confirm the accuracy of OP in reflecting the relative solubility of the resist in various solvents. This study presents a viable approach for developer screening, which will facilitate the development of resist materials.