Related Experiment Video
Updated: Jun 10, 2025
10:44
A Guided Materials Screening Approach for Developing Quantitative Sol-gel Derived Protein Microarrays
Published on: August 26, 2013
14.1K
Multiparameter Method for Developer Screening of Molecular Glass Resists via Molecular Simulations
Peng Lian1,2, Zhuoran Liu1,2, Rui Hu3
1Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China.
ACS Applied Materials & Interfaces
|October 15, 2024
Summary
A multiparameter (MP) method using Hansen solubility parameters (HSP), two-component solubility parameters (TSP), and order parameter (OP) aids developer screening for molecular glass resists. This approach, validated by experiments, accelerates the development of advanced lithography resist materials.
Area of Science:
- Materials Science
- Computational Chemistry
- Chemical Engineering
Background:
- High-resolution lithography demands efficient and accurate developer screening for novel molecular glass resists.
- Current methods may lack the precision needed for complex resist formulations.
Purpose of the Study:
- To propose and validate a multiparameter (MP) method for developer screening of molecular glass resists.
- To enhance the prediction accuracy of solvent-resist interactions using combined solubility parameters.
Main Methods:
- Development of a customized solvent database with 80 organic solvents.
- Application of molecular dynamics simulations incorporating Hansen solubility parameters (HSP), two-component solubility parameters (TSP), and order parameter (OP).
- Creation of HSP&OP and TSP&OP solubility prediction diagrams.
Main Results:
- The 2D HSP diagram showed better consistency with OP for solubility prediction compared to the 3D diagram.
- The MP method successfully screened developers for both decomposable (AD10BOC) and cross-linkable (AD4C) resists.
- Experimental lithography and dissolution tests confirmed the accuracy of the OP in predicting relative solubility.
Conclusions:
- The proposed multiparameter method offers a viable and accurate approach for developer screening in lithography.
- This method can significantly accelerate the discovery and development of new resist materials for advanced lithography applications.
