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Updated: Jun 10, 2025

Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
Published on: November 24, 2016
Significantly Enhanced Interfacial Thermal Conductance across GaN/Diamond Interfaces Utilizing AlGa1-N as a Phonon
Kongping Wu1,2, Guoqing Chang2, Jiandong Ye3
1School of Electronics and Information Engineering, Jinling Institute of Technology, Nanjing 211169, Jiangsu, China.
Abstract:
Improving the thermal conductance at the GaN/diamond interface is crucial for boosting GaN-based device performance and reliability. In this study, first-principles calculations and molecular dynamics simulations were employed to explore the interfacial thermal conductance of GaN/diamond interfaces with AlGa1-N transition layers. The AlGa1-N alloy exhibits a lower thermal conductivity than GaN, primarily due to enhanced anharmonic phonon scattering. However, for the interfacial thermal conductance at the GaN/diamond interface, we discovered that introducing an AlGa1-N with a high Al concentration (x > 0.5) as a phonon bridge between GaN and diamond can significantly enhance the interfacial thermal conductance. In particular, it increases from 4.79 MW·m-2 K-1 to a maximum of 158 MW·m-2 K-1 at x = 0.75, surpassing the 152 MW·m-2 K-1 achieved by AlN. The AlGa1-N alloy has been confirmed computationally as a more efficient phonon bridge, which can provide a valuable theoretical reference for experimentally investigating the thermal management and thermal design of high-power electronic devices based on the GaN/diamond interface.

