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Published on: February 10, 2014
High drain field impact ionization transistors as ideal switches
Baowei Yuan1,2, Zhibo Chen1, Yingxin Chen1
1State Key Laboratory of Integrated Chips and Systems, School of Information Science and Technology, Fudan University, Shanghai, China.
Abstract:
Impact ionization effect has been demonstrated in transistors to enable sub-60 mV dec-1 subthreshold swing. However, traditionally, impact ionization in silicon devices requires a high operation voltage due to limited electrical field near the device drain, contradicting the low energy operation purpose. Here, we report a vertical subthreshold swing device composed of a graphene/silicon heterojunction drain and a silicon channel. This structure creates a low voltage avalanche impact ionization phenomenon and leads to steep switching of the silicon-based device. Experimental measurements reveal a small average subthreshold swing of 16 µV dec-1 over 6 decades of drain current and nearly hysteresis-free, and the operating voltage at which a vertical subthreshold swing occurs can be as low as 0.4 V at room temperature. Furthermore, a complementary silicon-based logic inverter is experimentally demonstrated to reach a voltage gain of 311 at a supply voltage of 2 V.
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