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Updated: Jun 8, 2025

The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
Published on: May 24, 2020
Dainan Wang1, Weikang Dong1, Ping Wang1
1Centre for Quantum Physics, Key Laboratory of Advanced Optoelectronic Quantum Architecture and Measurement (MOE), School of Physics, Beijing Institute of Technology, Beijing, 100081, China.
Researchers developed new 2D dielectric materials, specifically alpha-antimony trioxide (α-Sb2O3) nanosheets, for advanced field-effect transistors. These materials enable higher performance in next-generation microelectronics.
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