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Updated: Jun 25, 2026

Atomically Defined Templates for Epitaxial Growth of Complex Oxide Thin Films
Published on: December 4, 2014
What could be the low-temperature limit of atomic layer deposition of platinum using MeCpPtMe3 and oxygen?
Hao Van Bui1, Anh Phan Nguyen1, Manh Duc Dang1
1Faculty of Materials Science and Engineering, Phenikaa University, Yen Nghia, Ha Dong District, Hanoi 12116, Vietnam. hao.buivan@phenikaa-uni.edu.vn.
Abstract:
We explore the low-temperature limit of atomic layer deposition of Pt using MeCpPtMe3 and O2. We reveal that by supplying a sufficiently high O2 exposure, highly dispersed and thermally stable Pt sub-nanometer clusters can be deposited onto the surface of P25 TiO2 nanoparticles even at room temperature by atmospheric-pressure ALD.
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