Related Experiment Video
Updated: Apr 13, 2026

Electric-field Control of Electronic States in WS2 Nanodevices by Electrolyte Gating
Published on: April 12, 2018
Wafer-Scale Ag2S-Based Memristive Crossbar Arrays with Ultra-Low Switching-Energies Reaching Biological Synapses
Yuan Zhu1, Tomas Nyberg1, Leif Nyholm2
1Division of Solid-State Electronics, Department of Electrical Engineering, Uppsala University, 75121, Uppsala, Sweden.
Abstract:
Memristive crossbar arrays (MCAs) offer parallel data storage and processing for energy-efficient neuromorphic computing. However, most wafer-scale MCAs that are compatible with complementary metal-oxide-semiconductor (CMOS) technology still suffer from substantially larger energy consumption than biological synapses, due to the slow kinetics of forming conductive paths inside the memristive units. Here we report wafer-scale Ag2S-based MCAs realized using CMOS-compatible processes at temperatures below 160 °C. Ag2S electrolytes supply highly mobile Ag+ ions, and provide the Ag/Ag2S interface with low silver nucleation barrier to form silver filaments at low energy costs. By further enhancing Ag+ migration in Ag2S electrolytes via microstructure modulation, the integrated memristors exhibit a record low threshold of approximately - 0.1 V, and demonstrate ultra-low switching-energies reaching femtojoule values as observed in biological synapses. The low-temperature process also enables MCA integration on polyimide substrates for applications in flexible electronics. Moreover, the intrinsic nonidealities of the memristive units for deep learning can be compensated by employing an advanced training algorithm. An impressive accuracy of 92.6% in image recognition simulations is demonstrated with the MCAs after the compensation. The demonstrated MCAs provide a promising device option for neuromorphic computing with ultra-high energy-efficiency.
More Related Videos
Related Concept Videos
Non-ohmic Devices
Consider a simple circuit consisting of a battery, a diode, and a resistor. A...
Metal-Semiconductor Junctions
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
Biasing of Metal-Semiconductor Junctions
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...
Biasing of FET
In an N-channel JFET, the structure consists of N-type material forming the channel on a P-type substrate, with the...
MOS Capacitor
The metal gate is typically made from highly conductive materials such as aluminum or polysilicon. Beneath the metal gate lies a thin layer of...
MOSFET: Enhancement Mode
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...

