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Design of subsurface defect detection system based on two channels.

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    This study introduces a novel dual-channel system for detecting both micro- and nanoscale subsurface defects in optical components. The system achieves high sensitivity, down to 100 nm, by optimizing aperture design and spot size for accurate defect analysis.

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    Area of Science:

    • Optical Engineering
    • Metrology
    • Materials Science

    Background:

    • Accurate detection of subsurface defects in optical components is critical for quality control.
    • Existing methods struggle to simultaneously detect defects at both micrometer and nanometer scales.

    Purpose of the Study:

    • To develop a system capable of independently detecting micro- and nanoscale subsurface defects.
    • To enhance the sensitivity and signal-to-noise ratio for subsurface defect detection.

    Main Methods:

    • Analysis of subsurface scratch scattering field models and simulation experiments.
    • Design and implementation of a dual-channel experimental system with adjustable spot size.
    • Development of a specialized aperture to minimize surface interference.

    Main Results:

    • The dual-channel system successfully differentiated between micrometer (narrow channel) and nanometer (wide channel) defects.
    • The designed aperture significantly improved the signal-to-noise ratio, achieving 100 nm detection sensitivity.
    • The Interquartile Range (IQR) algorithm proved most effective for data processing.

    Conclusions:

    • The developed system effectively detects subsurface defects at micro- and nanoscale levels.
    • Dynamic adjustment of spot size optimizes detection speed and sensitivity, with smaller spots favoring nanoscale defect detection.
    • The specialized aperture is crucial for enhancing detection sensitivity and accuracy.