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Related Experiment Video

Updated: Jun 6, 2025

Fabrication and Testing of Photonic Thermometers
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Fabrication tolerant multi-layer integrated photonic topology optimization.

Michael J Probst, Arjun Khurana, Joel B Slaby

    Optics Express
    |November 22, 2024
    PubMed
    Summary

    We developed a novel layer-restricted topology optimization (TO) method to improve multi-layer device fabrication. This technique addresses uncertainties in layer alignment and conformal layering for robust device design.

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    Area of Science:

    • Optics and photonics
    • Materials science
    • Computational engineering

    Background:

    • Multi-layer device fabrication faces challenges from inter-layer alignment and conformal layering uncertainties.
    • Topology optimization (TO) is crucial for designing complex devices but requires adaptation for multi-layer structures.
    • Existing TO methods struggle with the specific constraints of multi-layer fabrication processes.

    Purpose of the Study:

    • To introduce a novel layer-restricted topology optimization (TO) technique for multi-layer device design.
    • To develop a robust TO formulation that accounts for inter-layer misalignment.
    • To demonstrate the efficacy of these methods in practical photonic device applications.

    Main Methods:

    • Layer-restricted topology optimization (TO) was developed to control conformal layering.

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  • Several approaches compatible with density-based TO projection and geometric constraints were explored.
  • A robust TO formulation was created to enhance resilience against inter-layer misalignment.
  • The methods were applied to design 2D grating couplers and 3D polarization rotators.

    • Main Results:

    • The layer-restricted TO successfully mitigates unwanted conformal layering in multi-layer structures.
    • The robust TO formulation enables the design of devices tolerant to inter-layer misalignment.
    • Demonstrated improvements in 2D grating couplers and 3D polarization rotators using the novel methods.
    • The technique is compatible with multi-etch material platforms.

    Conclusions:

    • Layer-restricted TO is a novel and effective technique for optimizing multi-layer device fabrication.
    • Robust TO formulations are essential for designing devices resilient to fabrication uncertainties.
    • The presented methods offer a pathway to more reliable and high-performance multi-layer photonic devices.