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Published on: May 13, 2020
Stacking selected polarization switching and phase transition in vdW ferroelectric α-In2Se3 junction devices
Yuyang Wu1, Tianjiao Zhang2, Deping Guo3,4,5
1Laboratory of Advanced Materials, Shanghai Key Lab of Molecular Catalysis and Innovative Materials, Academy for Engineering & Technology, Fudan University, Shanghai, China.
Stacking order in two-dimensional ferroelectric indium selenide (α-In2Se3) significantly impacts domain wall behavior and resistance switching. Different stacking configurations (2H and 3R) enable tunable ferroelectric properties for advanced device engineering.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Nanotechnology
Background:
- Ferroelectric domain walls are crucial for polarization switching in ferroelectric materials.
- Their behavior in two-dimensional (2D) ferroelectrics, like α-In2Se3, is not well understood.
- Engineering interlayer interactions by controlling stacking order can modulate ferroelectric properties.
Purpose of the Study:
- To investigate stacking-dependent ferroelectric domain walls in 2D α-In2Se3.
- To elucidate the resistance switching mechanism in ferroelectric semiconductor-metal junction devices based on α-In2Se3.
- To understand how different stacking orders (2H and 3R) influence domain wall dynamics and phase transitions.
Main Methods:
- Fabrication and characterization of ferroelectric semiconductor-metal junction devices using 2H and 3R stacked α-In2Se3.
- Electrical transport measurements to analyze resistance switching behavior and hysteresis windows.
- Analysis of domain wall dynamics and ferroelectric-paraelectric phase transitions under high electric fields.
Main Results:
- 3R stacked α-In2Se3 exhibits a large hysteresis window due to in-plane movement of out-of-plane domain walls.
- 2H stacked α-In2Se3 shows a small hysteresis window, favoring in-plane domain walls and out-of-plane motion.
- High electric fields induce phase transitions: 3R α-In2Se3 via intralayer gliding, 2H α-In2Se3 via bond dissociation and reconstruction.
Conclusions:
- Stacking configuration is a key factor in tuning ferroelectric domain wall properties in 2D α-In2Se3.
- This provides a new avenue for material engineering in ferroelectric devices.
- Understanding stacking-dependent domain wall dynamics is essential for designing high-performance ferroelectric devices.
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