Electron Behavior
Van der Waals Interactions
The de Broglie Wavelength
Electron Behavior
Electrostatic Boundary Conditions
Magnetostatic Boundary Conditions
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Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
Published on: February 12, 2017
Jonathan G Raybin1, Ethan J Dunsworth2, Veronica Guo3
1Department of Chemistry, University of California, Berkeley, California 94720, United States.
Electron beams enable precise control over silica nanoparticle (NP) assembly on liquid surfaces. This method allows for dynamic, reversible colloidal patterning, overcoming limitations of traditional field-driven techniques for nanoscale materials.
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