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Generic characterization method for nano-gratings using deep-neural-network-assisted ellipsometry.

Zijie Jiang1, Zhuofei Gan1, Chuwei Liang1

  • 1Department of Mechanical Engineering, The University of Hong Kong, Hong Kong, China.

Nanophotonics (Berlin, Germany)
|December 5, 2024
PubMed
Summary
This summary is machine-generated.

Deep-neural-network-assisted ellipsometry offers a stable and accurate method for characterizing nano-gratings. This novel approach overcomes limitations of optical scatterometry for nanostructure analysis.

Keywords:
deep neural networkin-situ measurementinterference lithographynanoimprint lithographyreactive-ion etchingspectroscopic ellipsometry

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Area of Science:

  • Nanotechnology
  • Optical Physics
  • Materials Science

Background:

  • Optical scatterometry is a non-destructive technique for measuring film thickness and optical constants.
  • Deep learning advances offer new solutions for inverse scattering problems.
  • Current deep-neural-network-assisted optical scatterometry for nanostructures faces challenges in stability, functionality, and equipment demands.

Purpose of the Study:

  • To propose a novel characterization method using deep-neural-network-assisted ellipsometry for nanostructures.
  • To address the limitations of existing optical scatterometry techniques for nano-gratings.
  • To develop a stable, accurate, and efficient method for nano-grating characterization.

Main Methods:

  • Utilized ellipsometric angles measured by basic ellipsometers as functional signals.
  • Developed a comprehensive model incorporating rounded corners, residual layers, and optical constants for nano-grating profiling.
  • Enhanced model stability through multiple initial values and azimuth-resolved measurements.
  • Implemented a compensation algorithm to improve accuracy without sacrificing efficiency.

Main Results:

  • The proposed method accurately characterizes nano-gratings fabricated by diverse techniques.
  • Relative errors for both geometric and optical parameters were controlled under 5%.
  • Demonstrated rapid and accurate performance in experimental validation.

Conclusions:

  • Deep-neural-network-assisted ellipsometry provides a promising alternative to conventional characterization techniques.
  • The method is suitable for in-situ measurement of nano-gratings.
  • Overcame challenges associated with stability, functionality, and equipment requirements in previous methods.