Multilayer all-dielectric metasurfaces expanding color gamut

Structural color, arising from the interaction between nanostructures and light, has experienced rapid development in recent years. However, high-order Mie resonances in dielectric materials often induce unnecessary sub-peaks, particularly at shorter wavelengths, reducing the vibrancy of colors. To address this, we have developed a multilayer dielectric metasurface based on silicon-rich silicon nitride (SRN), achieving expanded color gamut through precise refractive index matching and suppression of high-order resonances. This strategy introduces more design dimensions and can reduce the complexity of material deposition. It enables the generation of vibrant colors in a 3 × 3 array, with a resolution of approximately 25,400 dpi, demonstrating its potential applications in displays.