Using reduced sericin as a green resist for precise pattern fabrication via water-based lithography

Area of Science:

• Materials Science
• Nanotechnology
• Biotechnology

Background:

• Traditional photolithography faces limitations due to toxic resists and complex procedures, hindering micro/nanofabrication quality.
• Developing advanced materials is crucial for overcoming these challenges and enabling precise patterning on diverse substrates.

Purpose of the Study:

• To develop a novel sericin nanofilm-based coating for high-resolution micro/nanofabrication.
• To explore the potential of this new material in various technological applications.

Main Methods:

• Sericin protein was modified by reducing disulfide bonds to create a reduced sericin (rSer) coating.
• Photomask-governed photolithography was employed to generate diverse geometric micro/nanopatterns on the rSer film.
• The patterned rSer films were utilized for fluorescent molecule encapsulation, cell culture, and chemical etching.

Main Results:

• The rSer coating enabled the generation of high-resolution geometric micro/nanopatterns via photolithography.
• Fluorescent micropatterns were created for anti-counterfeiting and encryption.
• Patterned rSer nanofilms supported biocompatible cell proliferation.
• Chemical etching transferred patterns onto silicon, creating structural colors and superhydrophobic surfaces inspired by lotus leaves.

Conclusions:

• The developed sericin nanofilm coating offers a versatile and high-resolution platform for micro/nanofabrication.
• This technology has significant potential for applications in semiconductors, anti-counterfeiting, smart displays, and superhydrophobic coatings.