Three-Dimensional Analysis of Strain
Raman Spectroscopy: Overview
Measurements of Strain
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Updated: Jun 1, 2025

Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
Published on: May 28, 2016
Andrew J Gayle1, Lawrence H Friedman1, Ryan Beams1
1Materials Measurement Science Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA.
Researchers mapped strain fields in silicon using electron backscatter diffraction (EBSD) and Raman spectroscopy. These techniques accurately assess multiaxial strain states, enhancing microelectromechanical systems (MEMS) reliability.
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