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Updated: May 27, 2025

Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films
Published on: August 19, 2016
Review on the optical and electrical properties of chalcogenide thin films: challenges and applications
1Electron Microscopy and Thin Films Department, Physics Research Institute, National Research Center, El-Bohoos Str., Dokki, Giza 12622, Egypt. wa.abdel-ghany@nrc.sci.eg.
Abstract:
Thin films play an essential role in our daily lives as they are utilized in various applications. The deposition techniques used to create thin films are categorized into two main types: physical and chemical deposition. Many materials are available in thin film form, including chalcogenides, which are cost-effective and possess excellent structural, optical, and electrical properties, making them suitable for various applications. They can be fabricated in binary, ternary, and quaternary forms, either in an amorphous or crystalline state. The optical and electrical properties of chalcogenide thin films are affected by several factors, such as the type of deposition, compositional effect, thickness, and annealing temperature. This review aims to compile research on chalcogenide thin films, highlighting their significant importance, preparation processes, and structural characteristics. Additionally, the theoretical and experimental models commonly used in optical and electrical studies of chalcogenide thin films have been discussed, including their parameters, such as the absorption coefficient, refractive index, nonlinear optical parameters, and DC and AC conductivity. Lastly, some challenges faced to achieve good results in practical applications by utilizing thin films and highlighting some of these applications have been briefly addressed and discussed.
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