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Polysilazane-Coated Films Achieving Record-High Moisture Barrier Performance with Sub-10 Seconds Densification Using
Luyang Song1, He Sun1, Yoshiyuki Suzuri1
1Innovation Center for Organic Electronics (INOEL), Yamagata University, Arcadia 1-808-48, Yonezawa, Yamagata, 992-0119, Japan.
Advanced Science (Weinheim, Baden-Wurttemberg, Germany)
|February 22, 2025
Summary
Ultra-high moisture barrier silicon nitride films are created using perhydropolysilazane and vacuum ultraviolet light. Higher light intensity optimizes film densification and achieves record low water vapor transmission rates for flexible electronics.
Area of Science:
- Materials Science
- Photochemistry
- Thin Film Technology
Background:
- Developing effective moisture barriers is crucial for protecting sensitive electronic components.
- Solution-processed films offer potential for cost-effective manufacturing.
- Perhydropolysilazane (PHPS) is a precursor for silicon nitride (SiNₓ) films.
Purpose of the Study:
- Investigate photochemical reactions and photo-densification of PHPS films under vacuum ultraviolet (VUV) light.
- Determine the effect of VUV light intensity on SiNₓ barrier performance.
- Establish optimal conditions for achieving ultra-high moisture barrier properties.
Main Methods:
- Exposure of solution-processed PHPS films to VUV light at varying intensities.
- Analysis of photochemical reactions, including bond cleavage (N─H, Si─H, Si─N).
- Measurement of water vapor transmission rate (WVTR) and film refractive index.
Main Results:
- Photo-dehydrogenation of PHPS is efficient and independent of VUV intensity.
- Photo-densification strongly depends on VUV intensity, particularly above 290 mW cm⁻².
- A record-low average WVTR of 1.6 × 10⁻⁵ g m⁻² day⁻¹ was achieved at 309 mW cm⁻².
- Optimal refractive index (1.74-1.77) for the top layer ensures WVTR within 10⁻⁵ g m⁻² day⁻¹.
Conclusions:
- VUV light-induced photo-densification is key to achieving ultra-high moisture barrier SiNₓ films from PHPS.
- High-intensity VUV processing enables rapid, solution-based fabrication of superior barrier films.
- These advanced barrier films are suitable for demanding applications in flexible electronics, including perovskite solar cells and organic photovoltaics.
