Tuning structures and properties of self-healing silsesquioxane films using block copolymers

Yoshiaki Miyamoto1, Takamichi Matsuno1,2,3, Atsushi Shimojima1,2,3

  • 1Department of Applied Chemistry, Faculty of Science and Engineering, Waseda University, 3-4-1 Okubo, Shinjuku-ku, Tokyo 169-8555, Japan. shimojima@waseda.jp.

Nanoscale
|February 26, 2025
PubMed
Summary

New organosiloxane films demonstrate remarkable self-healing capabilities. These crack-healing materials, utilizing polymeric surfactants, offer enhanced mechanical properties and stability for advanced coatings.

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