50 eV O+ ion induced deposition of tin dioxide using tetramethyltin

Satoru Yoshimura1, Takae Takeuchi1, Masato Kiuchi1,2

  • 1Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University, Suita, Osaka, 565-0871, Japan.

Heliyon
|February 26, 2025
PubMed

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