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Updated: May 25, 2025

A Novel Method for In Situ Electromechanical Characterization of Nanoscale Specimens
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Correction: AFM-IR investigation of thin PECVD SiO films on a polypropylene substrate in the surface-sensitive mode

Hendrik Müller1, Hartmut Stadler2, Teresa de Los Arcos1

  • 1Technical and Macromolecular Chemistry, Paderborn University, Warburger Str. 100, 33098 Paderborn, Germany.

Beilstein Journal of Nanotechnology
|February 27, 2025
PubMed

Keywords:
AFM-IRXPSpolypropylenesilicon oxidesurface-sensitive modethin films

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