Monolayer WSe2 Field-Effect Transistor Performance Enhancement by Atomic Defect Engineering and Passivation

Yuanqiu Tan1,2, Shao-Heng Yang1,2, Chih-Pin Lin1,2

  • 1Electrical and Computer Engineering, Purdue University, West Lafayette, Indiana 47907, United States.

ACS Nano
|February 27, 2025
PubMed
Summary

Researchers developed a new surface treatment for tungsten diselenide (WSe2) field-effect transistors (FETs). This method significantly improves device performance and stability, paving the way for advanced 2D electronics.