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An All-in-One Testing Chip for the Simultaneous Measurement of Multiple Thermoelectric Parameters in Doped
Lei Shi1,2, Na Zhou2,3, Jintao Wu1,2
1Key Laboratory of Micro/Nano Devices and Systems, North University of China, Ministry of Education, Taiyuan 030051, China.
Abstract:
Polysilicon is widely used as a thermoelectric material due to its CMOS compatibility and tunability through doping. The accurate measurement of the thermoelectric parameters-such as the Seebeck coefficient, thermal conductivity, and electrical resistivity-of polysilicon with various doping conditions is essential for designing and fabricating high-performance thermopile sensors. This work presents an all-in-one testing chip that incorporates double-layer thermoelectric structures on a suspended membrane-based supporting layer, with polysilicon constituting at least one of these thermoelectric layers. By employing a differential calculation approach in conjunction with thermal imaging methods, we could simultaneously measure various thermoelectric parameters-including resistivity, the Seebeck coefficient, and thermal conductivity-of polysilicon under different doping conditions. Furthermore, the method proposed in this study provides a means for accurately obtaining thermoelectric parameters for other materials, thereby facilitating the design and optimization of thermoelectric devices.

