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Freestanding 2D Glasses by Atomic Layer Deposition
Karen M Ehrhardt1, Jessica M Coleman1, Yuqing Gu1
1Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599, United States.
ACS Applied Materials & Interfaces
|March 20, 2025
Summary
Researchers developed a new method using Atomic Layer Deposition (ALD) on a modified sodium chloride (NaCl) surface to create large, freestanding ultrathin films. This technique overcomes previous challenges in removing ALD materials from substrates.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Chemistry
Background:
- Atomic Layer Deposition (ALD) enables precise synthesis of ultrathin materials.
- Strong substrate-ALD interactions hinder the fabrication of freestanding 2D films.
- Existing methods face challenges in substrate removal without damaging the ultrathin films.
Purpose of the Study:
- To develop a novel strategy for fabricating freestanding, large-area ultrathin films using ALD.
- To overcome the limitations of substrate removal in ALD processes.
- To enable access to freestanding 2D amorphous materials (glasses) at scale.
Main Methods:
- Growing ultrathin films (alumina, titania) on single-crystal sodium chloride (NaCl) substrates.
- Modifying the NaCl surface by inserting hydroxyl groups to create a heterogeneous interface.
- Utilizing a poly(methyl methacrylate) scaffold for transferring the freestanding films to arbitrary substrates.
Main Results:
- Successfully fabricated freestanding, amorphous ultrathin alumina and titania films.
- Demonstrated facile removal of the films from the modified NaCl substrate under mild conditions with minimal damage.
- Achieved large-area films (1 cm²) with low crack and pinhole density, transferable to new substrates.
Conclusions:
- The tailored NaCl substrate strategy effectively facilitates the production of freestanding ultrathin films via ALD.
- This method provides a scalable and accessible route to fabricating 2D amorphous materials.
- The developed technique opens new possibilities for applications requiring large-area, freestanding ultrathin films.
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