Ultrafast Dynamics and Rearrangement of the EUV Photoacid Generator Phenyl Triflate

Sung Kwon1, Jacob Stamm1, Marcos Dantus1,2,3

  • 1Department of Chemistry, Michigan State University, East Lansing, Michigan 48824, United States.

Summary

This study tracks the ultrafast chemical reactions of phenyl triflate, a key component in extreme UV photolithography, revealing its molecular behavior under high-energy conditions crucial for chip manufacturing.

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