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Protocol for fabricating optically transparent, pinhole-free NiO thin film for memory devices using the spin-coating
Adiba Adiba1, Franco Mayanglambam2, Tufail Ahmad1
1Department of Physics, Aligarh Muslim University, Aligarh, Uttar Pradesh 202002, India.
STAR Protocols
|April 5, 2025
Abstract
None:
Fabricating visibly transparent and uniform metal oxide thin films is a significant challenge. Here, we present a protocol for the fabrication of NiO thin films. We detail the essential steps for substrate preparation. We then describe the optimized steps for spin coating, considering various parameters such as the concentration of the precursor solution, drying temperature, annealing temperature, and spin-coating speed.
