Band Alignment and Interfacial Stability of Co3O4 vs NiO as a Hole Transport Layer with FA0.4MA0.6PbI3 Perovskite

Xuewei Zhang1,2, Xiaxia Cui3,4, Qidong Tai5

  • 1Laboratory for Computational Engineering, Swiss Federal Laboratories for Materials Science and Technology, Empa institution, Dübendorf 8600, Switzerland.

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