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Updated: May 15, 2025

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
Nanoscale Polymorph Engineering of Metal-Correlated Insulator Junctions in Monolayer NbSe2
Yaoyao Chen1, Yi-Xin Dai2,3, Yu Zhang1,4
1School of Integrated Circuits and Electronics MIIT Key Laboratory for Low-Dimensional Quantum Structure and Devices, Beijing Institute of Technology, Beijing 100081, People's Republic of China.
Abstract:
Lateral junctions composed of quantum many-body materials are highly desirable for realizing physical phenomena and device concepts. However, controllable fabrication of high-quality junctions is challenging, which greatly hinders further exploration. Here, we successfully realize monolayer heterophase homojunctions of metallic H-NbSe2 and correlated insulating T-NbSe2 with atomically sharp boundaries via nanoscale polymorph engineering. By applying a scanning tunneling microscopy (STM) tip pulse, T-NbSe2 can be locally introduced from H-NbSe2 on the side beneath the tip, thus realizing H/T-NbSe2 heterophase homojunctions. Our in situ STM measurements, complementary by the theoretical calculations, reveal two types of atomically sharp boundaries with distinct abilities for electron transmission, owing to the structure-dependent boundary coupling effects. Moreover, there are significant electronic interactions among the metallic, correlated insulating, and charge-density-wave states at the H/T-NbSe2 boundaries. Our results provide insight into the interacting mechanism among diverse quantum many-body states.
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