Sharpless Epoxidation
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Updated: May 13, 2025

Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers
Published on: February 8, 2022
Yejin Han1, Jihwan Jeong1, Hyein Cho1
1Department of Chemical Engineering, Kangwon National University, Chuncheon, 24341, Republic of Korea.
Controlling silicon nanostructure fabrication with metal-assisted chemical etching (MaCE) is challenging due to isotropic etching. This study shows catalyst morphology dictates etching direction, with thermal treatment enabling precise vertical etching.
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