A Novel Method of Adding Sucrose in Fixed Abrasive Pads for Self-Conditioning

Area of Science:

• Materials Science
• Manufacturing Engineering

Background:

• Fixed abrasive pads are crucial for lapping processes.
• Pad conditioning is essential for maintaining efficiency and surface quality.
• Current conditioning methods can be time-consuming and labor-intensive.

Purpose of the Study:

• To propose and investigate a novel self-conditioning mechanism for fixed abrasive pads.
• To evaluate the performance of sucrose resin-based pads during monocrystalline silicon wafer lapping.
• To understand the relationship between sucrose dissolution rate and pad performance.

Main Methods:

• Developed sucrose resin-based fixed abrasive pads.
• Conducted lapping experiments on monocrystalline silicon wafers.
• Measured material removal rate (MRR), pad wear rate (PWR), and surface roughness (Sa).
• Analyzed pad surface topography and microstructure evolution.

Main Results:

• Achieved a maximum MRR of 18.99 nm/min.
• Reduced surface roughness (Sa) from 409.8 nm to 64.3 nm.
• Demonstrated controllable self-conditioning rates by adjusting sucrose dissolution.
• Illustrated the self-conditioning mechanism and wear processes.

Conclusions:

• Sucrose-based fixed abrasive pads offer effective self-conditioning capabilities.
• The self-conditioning method enhances lapping efficiency and surface quality for silicon wafers.
• Understanding microstructure evolution is key to optimizing pad performance.