Perfectly Spatial and Shape-Controllable Nanocrack Lithography via Localized Compressive-Shear Stress Coupling

Xu Tian1,2, Sang-Min Kim3, Jae-Young Yoo4

  • 1School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea.

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