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End-to-end learned diffractive imaging system lithography adaptation design using hierarchical-dynamic simulation.

Xuzhe Zhong, Hongyuan Wang, Ziyang Liu

    Optics Letters
    |May 1, 2025
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    Summary
    This summary is machine-generated.

    This study introduces a new diffractive imaging system design that accounts for manufacturing errors. The method improves robustness against height errors, crucial for reliable diffractive optical element performance.

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    Area of Science:

    • Computational imaging
    • Optical system design
    • Lithography

    Background:

    • Existing diffractive imaging system design methods struggle with efficient diffraction simulation.
    • Lithographic process height errors negatively impact imaging system performance due to deviations from continuous models.

    Purpose of the Study:

    • To propose an end-to-end diffractive imaging system design method that incorporates lithographic process characteristics.
    • To mitigate the impact of height errors in diffractive optical elements (DOEs).

    Main Methods:

    • Utilized a hierarchical discrete model for simulation, constraining height distributions for lithography.
    • Implemented dynamic zero padding in point spread function (PSF) calculation for speed enhancement.
    • Jointly optimized the DOE and image reconstruction network (gated Wiener-Lucy chain) end-to-end.

    Main Results:

    • Achieved a 51.78% speed increase in PSF calculation.
    • The proposed method demonstrates greater robustness against height errors compared to continuous DOE designs.
    • Reconstructed images showed a minor 0.3 dB PSNR decrease but improved error tolerance.

    Conclusions:

    • The developed method effectively integrates lithographic process constraints into DOE design.
    • This approach offers a robust solution for diffractive imaging systems facing manufacturing imperfections.
    • Provides a valuable reference for future DOE designs considering manufacturing process characteristics.