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Highly integrated multiplexed microscopy system for integrated circuit failure analysis.

Haotian Li, Junliang Liu, Cheng Fei

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    |May 1, 2025
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    Summary
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    This study introduces an advanced optical multiplexing system for non-destructive semiconductor defect detection. The integrated system rapidly identifies integrated circuit failures, enabling precise root cause analysis.

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    Area of Science:

    • Optoelectronics
    • Materials Science
    • Semiconductor Physics

    Background:

    • Integrated circuit (IC) failure analysis and semiconductor defect detection are critical for manufacturing quality.
    • Current inspection methods may lack the integration and non-destructive capabilities required for advanced analysis.
    • Developing advanced optical systems is essential for improving the efficiency and accuracy of defect identification.

    Purpose of the Study:

    • To present a novel optical multiplexing structure for a highly integrated, non-contact, non-destructive inspection system.
    • To enable advanced failure analysis and semiconductor defect detection in integrated circuits.
    • To verify the system's functionality using avalanche photodetectors and multimodal detection.

    Main Methods:

    • The system integrates four subsystems: bright-/dark-field microscopy, emission microscopy, laser confocal scanning microscopy, and fluorescence confocal microscopy.
    • Avalanche photodetectors are utilized for system verification and analysis.
    • The detection process includes locating light-emitting devices, 3D imaging for damage assessment, and fluorescence lifetime comparison.

    Main Results:

    • The multimodal optical multiplexing system demonstrates effective non-contact and non-destructive inspection capabilities.
    • The system successfully performs 3D imaging and analyzes fluorescence lifetimes for failure mechanism identification.
    • Functionality is verified, showing potential for rapid and accurate production issue identification.

    Conclusions:

    • The developed optical multiplexing structure facilitates a highly integrated system for semiconductor defect detection.
    • This multimodal approach enables rapid and accurate identification of production issues and tracing of failure root causes.
    • The system offers a promising solution for advanced integrated circuit failure analysis.