Pixelation of perovskite quantum wire thin films with 0.18-μm features and 63,500-ppi pixel density

Halide perovskite materials excel in broad optoelectronic applications, and there is an urgent demand to develop perovskite-based integrated optoelectronic devices. However, the limitations posed by the incompatibility of perovskite thin film with wet lithography greatly hinder its potential in many important applications, including ultrahigh-density displays, high-resolution image sensors, high-density memristors, and integrated photonic circuitry. To tackle this bottleneck problem, we develop the self-aligned close-spaced sublimation growth of perovskite quantum wires and demonstrate 0.18-micrometer feature size perovskite patterns, meanwhile achieving a pixel density of 63,500 pixels per inch, the highest reported for perovskite. We showcase pixelation of perovskite quantum wires with color conversion films, addressing the need for full-color microdisplays. In addition, we demonstrate these films on curved substrates, holding promise for near-eye microdisplays. Processes shown here can also apply to other perovskite devices such as high-resolution displays, image sensing, and memristor arrays.