Development of cylindrical magnetron sputtering apparatus for large area TiN thin film coatings

Cylindrical magnetron sputtering (CMS) is a crucial technique in the realm of thin film deposition over large area surfaces, offering advantages in uniformity and material utilization efficiency. This work provides a detailed overview of a novel CMS apparatus, emphasizing its design elements and operational intricacies. The CMS unit employs a unique magnet arrangement with AlNiCo Grade 5 magnets and shielding materials to optimize the magnetic field distribution. I-V characteristic analysis reveals insights into plasma initiation and efficiency at different pressures and frequencies, guiding process optimization. In addition, a comprehensive characterization of deposited TiN specimens has been carried out by employing various advanced analytical techniques such as grazing incidence x-ray diffraction and scanning probe microscopy. The results underscore the efficacy of the CMS setup in achieving unique growth kinetics and morphological evolution during the deposition process. Furthermore, scanning probe microscopy reveals self-assembled nano-hill structures in the deposited films, attributed to shadowing effects from the cylindrical target. This paper highlights the potential of CMS for large-area coating applications and provides valuable insights into process control and film characterization.