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Updated: Jun 18, 2026

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
Published on: February 12, 2017
Jiao Wu1,2, Jiali Chen1,3, Liming Wang4
1State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, Fujian 350002, P. R. China. xfyi@fjirsm.ac.cn.
Researchers developed a new ligand-regulation strategy for indium-titanium-oxo clusters, enabling precise control for advanced nanolithography. This breakthrough enhances solution processability and film quality, paving the way for high-resolution patterning.
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