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Optimization of Diamond Polishing Process for Sub-Nanometer Roughness Using Ar/O2/SF6 Plasma.

Lei Zhao1,2, Xiangbing Wang1,2, Minxing Jiang2,3

  • 1School of Mechanical Engineering, Yangzhou University, Yangzhou 225009, China.

Materials (Basel, Switzerland)
|June 13, 2025
PubMed
Summary

Inductively coupled plasma (ICP) polishing significantly reduces single-crystal diamond surface roughness. Optimized parameters achieved a 74.7% decrease, enhancing diamond suitability for precision optics.

Keywords:
atomic force microscopyinductively coupled plasmaprocess parametersroughnesssingle-crystal diamond

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Area of Science:

  • Materials Science
  • Surface Engineering
  • Nanotechnology

Background:

  • Single-crystal diamond possesses unique properties valuable for advanced applications.
  • Surface roughness is a critical factor limiting diamond's performance in high-precision fields.
  • Existing surface modification techniques require optimization for diamond.

Purpose of the Study:

  • To optimize inductively coupled plasma (ICP) polishing parameters for reducing single-crystal diamond surface roughness.
  • To investigate the influence of various etching parameters on diamond surface topography.
  • To achieve ultra-smooth diamond surfaces for enhanced optical applications.

Main Methods:

  • Utilized ICP polishing to etch single-crystal diamond samples.
  • Employed atomic force microscopy (AFM) to quantify surface roughness before and after etching.
  • Systematically varied gas flow ratios (Ar/O2/SF6), ICP power, RF bias power, chamber pressure, and etching time.

Main Results:

  • Optimal parameters identified: 40/50/10 sccm Ar/O2/SF6, 200 W ICP power, 40 W RF bias power, 20 mTorr pressure, and 10 min etching time.
  • Etching time and SF6 flow rate increased roughness; higher ICP/RF power reduced roughness but induced nanostructures.
  • Lower chamber pressure minimized roughness increase, while higher pressure exacerbated it.

Conclusions:

  • The optimized ICP polishing process effectively reduces single-crystal diamond surface roughness.
  • Achieved a 74.7% reduction in roughness (from 2.22 nm to 0.562 nm) using optimized parameters.
  • The enhanced surface quality makes diamond more suitable for demanding high-precision optical applications.