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Chromatic focus variation microscopy for surface metrology.

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    This study introduces a new chromatic focus variation (CFV) method for optical metrology, replacing mechanical scanning with wavelength scanning. This innovation enhances measurement speed and instrument compactness for industrial applications.

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    Area of Science:

    • Optical metrology
    • Surface characterization
    • Microscopy

    Background:

    • Optical metrology is crucial for industry and research.
    • Traditional focus variation (FV) microscopes use mechanical scanning, limiting speed and compactness.
    • Mechanical scanning requires maintenance and calibration, impacting accuracy.

    Purpose of the Study:

    • To propose and validate a novel chromatic focus variation (CFV) method.
    • To overcome limitations of traditional FV instruments, such as speed and size.
    • To enable more compact and faster on-machine metrology.

    Main Methods:

    • Developed a CFV system utilizing a dispersive objective lens for axial focus scanning.
    • Replaced mechanical scanning with a wavelength scanning mechanism.
    • Analyzed optical performance of the dispersive objective lens.

    Main Results:

    • The CFV method demonstrated enhanced measurement speed and reduced instrument size.
    • Experimental validation on a 30 µm step height and a 19 µm sine wave showed good agreement with a commercial instrument (Alicona G5).
    • Detailed analysis confirmed the measurement accuracy of the CFV system.

    Conclusions:

    • The proposed CFV method offers a viable alternative to traditional FV microscopy.
    • CFV technology enables faster and more compact optical metrology solutions.
    • This advancement is particularly beneficial for in-situ and on-machine measurement tasks.