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Updated: Sep 18, 2025
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Fine-tuning the Size and Minimizing the Noise of Solid-state Nanopores
Published on: October 31, 2013
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Wafer-scale fabrication of solid-state nanopore array with a novel SpacerX process
Lihuan Zhao1, Jiajun Wang2, Lin-Sheng Wu1
1State Key Laboratory of Radio Frequency Heterogeneous Integration, Shanghai Jiao Tong University, Shanghai, China.
Microsystems & Nanoengineering
|June 24, 2025
Summary
A new SpacerX fabrication process enables cost-effective, wafer-scale production of solid-state nanopore arrays. This scalable method achieves high yields and tunable nanopore sizes for applications in DNA analysis and beyond.
Area of Science:
- Nanotechnology
- Biotechnology
- Materials Science
Background:
- Solid-state nanopores (SSNPs) are crucial for nanoscale applications but face fabrication challenges.
- Existing methods lack cost-effectiveness and reproducibility for widespread adoption.
Purpose of the Study:
- Introduce a novel, scalable fabrication process for well-ordered SSNP arrays.
- Enable mass production of sub-10 nm SSNPs at low cost.
Main Methods:
- Developed the SpacerX process, inspired by semiconductor spacer patterning.
- Utilized two UV lithography steps with a single mask for wafer-scale fabrication.
- Demonstrated tunable nanopore dimensions (~30 nm down to 10 nm) and high open-pore rates (>99.9%).
Main Results:
- Fabricated silicon nitride (Si3N4) nanopore arrays with ~30 nm diameter, <10% non-uniformity, and 10 μm spacing.
- Achieved nanopore diameters as small as 10 nm by reducing spacer size.
- Demonstrated increased DNA molecule detection throughput using dual-pore devices.
Conclusions:
- The SpacerX process is scalable, reproducible, and cost-effective for SSNP fabrication.
- This technique is readily adoptable by commercial foundries for mass production.
- Facilitates the widespread application of SSNPs in nanotechnology and biotechnology.
