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Published on: March 27, 2018
Sliding ferroelectricity of multilayer h-BN
Zijun Li1, Le Fang1,2, Hui Zhang1
1Physics Department, Materials Genome Institute, Shanghai Engineering Research Center for Integrated Circuits and Advanced Display Materials, State Key Laboratory of Advanced Refractories, Institute for Quantum Science and Technology, International Centre of Quantum and Molecular Structures, Shanghai University, Shanghai 200444, China. hzhang23@shu.edu.cn.
Abstract:
The emergence of two-dimensional ferroelectrics has spurred significant interest for beyond-Moore electronics. Recent breakthroughs have demonstrated the robust out-of-plane ferroelectricity in specifically engineered hexagonal boron nitride (h-BN) configurations via interlayer sliding mechanisms. We systematically investigate stacking-dependent ferroelectric ordering in multilayer h-BN using first principles calculation methods and the modern theory of polarization. In the h-BN of three layers, interlayer slip disrupts the spatial inversion symmetry of the structure, generating switchable out-of-plane dipoles modulated by stacking sequences. Symmetry analysis of trilayer h-BN reveals 36 distinct stacking orders. These are grouped into 4 transformation sets, each containing 9 stackings that are mutually convertible via interlayer sliding. Among these, 30 configurations are non-centrosymmetric. This provides more options for exhibiting ferroelectricity than the bilayer system, where only AB/BA stacking configurations possess an electric dipole moment. We systematically calculate the different characteristics of single-layer sliding and double-layer sliding in trilayer h-BN. When the number of layers further increases, we propose two stacking strategies to enhance electric dipole moments: (1) introducing AB stacking for polarization accumulation and (2) employing AA' antiparallel stacking to amplify vertical dipoles. These findings provide fundamental insights into sliding ferroelectric mechanisms in h-BN multilayers and establish design principles for developing ultracompact ferroelectric devices with tailored polarization characteristics.
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